Join Applied Materials at the 2019 SPIE Advanced Lithography Symposium as we present our latest R&D advancements on layer-to-layer alignment, defect detection and 3D pattern characterization, and highlight new e-beam technology.
Applied Materials and National University of Singapore jointly open a new R&D lab with support of the National Research Foundation Singapore. The goal of the collaboration is to accelerate the discovery and commercialization of new materials for manufacturing next-generation semiconductors.
At this year’s SPIE symposium Applied Materials will present several technical papers focused on solving some of the industry’s toughest patterning challenges.
